X-ray image resolution of carbon nanotube emitters grown with resist-assisted patterning process

Yi Sang Lee; Je Hwang Ryu; Han Eol Lim; Jun Won Lim; Byung Taek Son; Jong Uk Kim; Jin Jang; Kyu Chang Park

doi:10.1016/j.vacuum.2009.06.026

X-ray image resolution of carbon nanotube emitters grown with resist-assisted patterning process

Yi Sang Lee
, Je Hwang Ryu
, Han Eol Lim
, Jun Won Lim
, Byung Taek Son
, Jong Uk Kim
, Jin Jang
, Kyu Chang Park

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We obtained X-ray images using carbon nanotube arrays. The electron emitter was fabricated using the resist-assisted patterning (RAP) process. The X-ray image was obtained with a current of 300 μA at an anode bias of 30 kVp. The emitter had a pattern width of 5 μm and a pitch of 40 μm producing a turn-on field of 1.5 V/μm with a field emission current of 10 μA/cm². The resulting X-ray image clearly shows micrometer scale lines on an integrated circuit chip bonded in a printed circuit board.

Original language	English
Pages (from-to)	523-525
Number of pages	3
Journal	Vacuum
Volume	84
Issue number	5
DOIs	https://doi.org/10.1016/j.vacuum.2009.06.026
Publication status	Published - 10 Dec 2009

Keywords

Carbon nanotube emitters
Electron emission
Resist-assisted patterning (RAP)
X-ray image

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10.1016/j.vacuum.2009.06.026

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title = "X-ray image resolution of carbon nanotube emitters grown with resist-assisted patterning process",

abstract = "We obtained X-ray images using carbon nanotube arrays. The electron emitter was fabricated using the resist-assisted patterning (RAP) process. The X-ray image was obtained with a current of 300 μA at an anode bias of 30 kVp. The emitter had a pattern width of 5 μm and a pitch of 40 μm producing a turn-on field of 1.5 V/μm with a field emission current of 10 μA/cm2. The resulting X-ray image clearly shows micrometer scale lines on an integrated circuit chip bonded in a printed circuit board.",

keywords = "Carbon nanotube emitters, Electron emission, Resist-assisted patterning (RAP), X-ray image",

author = "Lee, \{Yi Sang\} and Ryu, \{Je Hwang\} and Lim, \{Han Eol\} and Lim, \{Jun Won\} and Son, \{Byung Taek\} and Kim, \{Jong Uk\} and Jin Jang and Park, \{Kyu Chang\}",

year = "2009",

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doi = "10.1016/j.vacuum.2009.06.026",

language = "English",

volume = "84",

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journal = "Vacuum",

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TY - JOUR

T1 - X-ray image resolution of carbon nanotube emitters grown with resist-assisted patterning process

AU - Lee, Yi Sang

AU - Ryu, Je Hwang

AU - Lim, Han Eol

AU - Lim, Jun Won

AU - Son, Byung Taek

AU - Kim, Jong Uk

AU - Jang, Jin

AU - Park, Kyu Chang

PY - 2009/12/10

Y1 - 2009/12/10

N2 - We obtained X-ray images using carbon nanotube arrays. The electron emitter was fabricated using the resist-assisted patterning (RAP) process. The X-ray image was obtained with a current of 300 μA at an anode bias of 30 kVp. The emitter had a pattern width of 5 μm and a pitch of 40 μm producing a turn-on field of 1.5 V/μm with a field emission current of 10 μA/cm2. The resulting X-ray image clearly shows micrometer scale lines on an integrated circuit chip bonded in a printed circuit board.

AB - We obtained X-ray images using carbon nanotube arrays. The electron emitter was fabricated using the resist-assisted patterning (RAP) process. The X-ray image was obtained with a current of 300 μA at an anode bias of 30 kVp. The emitter had a pattern width of 5 μm and a pitch of 40 μm producing a turn-on field of 1.5 V/μm with a field emission current of 10 μA/cm2. The resulting X-ray image clearly shows micrometer scale lines on an integrated circuit chip bonded in a printed circuit board.

KW - Carbon nanotube emitters

KW - Electron emission

KW - Resist-assisted patterning (RAP)

KW - X-ray image

UR - https://www.scopus.com/pages/publications/70649089448

U2 - 10.1016/j.vacuum.2009.06.026

DO - 10.1016/j.vacuum.2009.06.026

M3 - Article

AN - SCOPUS:70649089448

SN - 0042-207X

VL - 84

SP - 523

EP - 525

JO - Vacuum

JF - Vacuum

IS - 5

ER -

X-ray image resolution of carbon nanotube emitters grown with resist-assisted patterning process

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Keywords

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